3D激光共聚焦形貌显微镜是一种高速共焦激光扫描显微镜(CLSM),用于可靠的三维测量,从一系列光学剖切图像中提供目标物体的三维描述,通过该算法,横截面图像被直接转换为三维轮廓数据。这种*的原始截面图像,直观地解释,使表面轮廓数据优于其他光学技术。
3D激光共聚焦形貌显微镜特点
-高分辨率无损光学三维测量
-实时共焦成像
-各种光学变焦
-同时亮场和共焦成像
-具有精细自动聚焦的自动增益搜索
-倾斜补偿
-简易分析模式
-精密可靠的高速测高
-通过半透明基板检查特征
-无样品制备
-宽范围检测的图像拼接
3D激光共聚焦形貌显微镜应用
-半导体:IC图形,凸点高度,线圈高度,缺陷检查,CMP工艺
-FPD产品:触摸屏检查,ITO图案,LCD柱垫高度
-MEMS器件:结构的三维轮廓,表面粗糙度,MEMS图形
-玻璃表面:薄膜太阳能电池,太阳能电池纹理,激光图案
-材料研究:模具表面检查,粗糙度,裂纹分析
3D激光共聚焦形貌显微镜测量表面粗糙度
3D激光共聚焦形貌显微镜规格参数
型号 | 显微镜 | NS-3600 | Remark | |||
---|---|---|---|---|---|---|
物镜放大倍数 | 10× | 20× | 50× | 100× | ||
观察/ 测量范围 | 水平 (H): μm | 1400 | 700 | 280 | 140 | |
竖直 (V): μm | 1050 | 525 | 210 | 105 | ||
工作距离: mm | 17.5 | 4.5 | 1.0 | 1.0 | ||
数值孔径 (N.A.) | 0.30 | 0.45 | 1.0 | 1.0 | ||
观察/测量的光学系统 | 小孔聚焦光学系统 | |||||
Height Measurement | Measuring scan range | 10 mm | ||||
Display resolution | 0.001 μm | |||||
Repeatability σ | 0.02 μm | Note 1 | ||||
Width measurement | Display resolution | 0.001 μm | ||||
Repeatability 3σ | 0.03 μm | Note 2 | ||||
Frame memory | Pixel count | 1024x1024, 1024×768, 1024×384, 1024×192, 1024×96 | ||||
For confocal image | 12 bit | |||||
For color image | 8-bit for RGB each | |||||
For height measurement | 16 bit | |||||
Frame rate | Surface scan | 20 Hz to 160 Hz | ||||
Line scan | ~8 kHz | |||||
Laser beam light source for confocal measurement | Wavelength | Red laser, 638 nm | ||||
Output | ~2 mW | |||||
Laser Class | Class 3b | |||||
Laser light-receiving element | PMT (photomultiplier tube) | |||||
Light source for optical observation | Lamp | LED | ||||
Color camera for Optical observation | Imaging element | Color CCD image sensor | ||||
Recording resolution | 1296x966 | |||||
Data processing unit | Dedicated PC | |||||
Power supply | Power-supply voltage | 100 to 240 VAC, 50/60 Hz | ||||
Current consumption | 500 VA max. | |||||
Weight | Microscope | Approx. ~50 kg (Measuring head unit : ~12.5 kg) | ||||
Controller | ~8 kg | |||||
Vibration isolating system | Pneumatic isolator |
Note 1 :
100 times measurement of standard sample (1μm step height) with 100× / 0.9 objective.
Note 2 :
100 times measurement of standard sample (5μm pitch) with 100× / 0.9 objective.
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